Recently, the Korean media reported that the Graphene Labs of Korean companies have developed the EUV mask protective film based on graphene manufacturing.
After using this EUV mask protective film, when using the EUV photoreal to produce chip production, it is expected to significantly increase the yield of production chips.
Korean enterprises have developed a graphene EUV mask protective film, which can greatly increase the yield rate of a 5nm chip
For a while, it attracted the attention of countless people. After all, the yield is now a sharp sword hanging on the wafer fab and other wafer fabs, and the more advanced craftsmanship, the lower the yield.
For example, there were media reports before that Samsung’s 5nm and 4nm processes were low to outrageous, even only about 30 %, which could not stand Qualcomm and had to transfer to TSMC.
And once it can greatly increase the good rate, isn’t a wafer factory like Samsung ask for buying? Increasing yield to reduce costs and enhance competitiveness.
Korean enterprises have developed a graphene EUV mask protective film, which can greatly increase the yield rate of a 5nm chip
So the question is, what film is the graphene EUV mask protective film and why does it have this effect?
We know that in chip manufacturing, the role of the EUV optical carved machine is to record the circuit diagram on the luminous membrane board through the EUV light to the silicon wafers coated with the light glue.
This is a vital part. The light mask plate is also the most expensive part of the chip flow. The cost of a 7nm light covering membrane board quickly rose to $ 15 million.
There is a layer of protective film on the luminous film plate. The surface of the protective mask is exempted from the influence of micro mics or pollutants in the air, and the effect of protection when the EUV light burns.
Korean enterprises have developed a graphene EUV mask protective film, which can greatly increase the yield rate of 5nm chip
It is made of silicon material for this layer of membrane. Now Korean enterprises use graphene to make this protective film, which is the protective film of graphene EUV mask.
Graphene has better performance, can withstand higher temperatures, and at the same time has higher hardness and better permeability. Therefore, when EUV light performs lithography, it can reduce misjudgment and increase the yield.
Graphen Lab said that their graphene EUV mask protective film will soon be mass -produced. If it is really amazing, then manufacturers such as Samsung, TSMC, Intel, The market and even wafer market pattern may be rewritten.